Thermal Stability and Sublimation Pressures of Some Ruthenocene Compounds

We set out to study the use of a series of ruthenocenes as possible and promising sources for ruthenium and/or ruthenium oxide film formation.The thermal stability of a series of ruthenocenes, including (η-C5H4R)(η-C5H4R ́)Ru (1), R = R ́ = H (3), R = H, R ́ = CH2NMe2 (5), R = H, R ́= C(O)Me (6), R = R ́ = C(O)Me (7), R = H, R ́ = C(O)(CH2)3CO2H (8), R = H, R ́ = C(O)(CH2)2CO2H (9), R = H, R ́ = C(O)(CH2)3CO2Me (10), R = H, R ́= C(O)(CH2)2CO2Me (11), R = R ́ = SiMe3), (η-C4H3O-2,4-Me2)2Ru (2), and (η-C5H5-2,4-Me2)2Ru (4) was studied by thermogravimetry. From these studies, it could be concluded that 1–4, 6 and 9–11 are the most thermally stable molecules. The sublimation pressure of these sandwich compounds was measured using a Knudsen cell. Among these, the compound 11 shows the highest vapor pressure.